Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering

Jong Cheol Lee, Sang Yub Le, Seung Lel Park, Yeonjin Yi, Gyu In Jang, Ho Shik Song, Dong Gyun You, Kwangho Jeong

Research output: Contribution to journalArticle

Abstract

Bias sputtering was employed to reduce the bombardment to the growing film by negative metal oxide ions or negative oxygen ions. Polycrystalline La-Ba-Mn-O thin films were grown using rf magnetron sputtering on Si (100) substrates. The temperature dependence of electrical resistivity was shown for films with grounded or negatively biased substrate.

Original languageEnglish
Pages (from-to)2115-2118
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume20
Issue number6
DOIs
Publication statusPublished - 2002 Nov

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering'. Together they form a unique fingerprint.

  • Cite this