In this paper, we present an edge-adaptive demosaicking method for artifact suppression along line edges. Although various demosaicking methods have been proposed, they still suffer from artifacts along line edges. In order to suppress these undesirable artifacts, the proposed method first determines the pattern of line edges and interpolates missing pixels along the detected direction during initial interpolation. Then, refinement and calibration processes are carried out in series to improve image quality. Experimental results demonstrate that the proposed method produces visually pleasing images and outperforms existing demosaicking methods in terms of the peak signal-to-noise ratio (PSNR) and the mean squared error of S-CIELAB.
Bibliographical noteFunding Information:
1This research was supported by the MIC (Ministry of Information and Communication), South Korea, under the ITRC (Information Technology Research Center) support program supervised by the IITA (Institute of Information Technology Assessment). (IITA-2005-(C1090-0502-0027)) Chulhee Lee is with the Yonsei University, Seoul, South Korea (e-mail: firstname.lastname@example.org).
All Science Journal Classification (ASJC) codes
- Media Technology
- Electrical and Electronic Engineering