Effect of boron-implantation on the strain-relaxation of pseudomorphic metastable Ge0.06Si0.94 alloy layers

M. S. Oh, Seongil Im, H. B. Kim, J. H. Song

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication1998 International Microprocesses and Nanotechnology Conference
EditorsHyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages202-203
Number of pages2
ISBN (Electronic)4930813832, 9784930813831
DOIs
Publication statusPublished - 1998 Jan 1
Event1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of
Duration: 1998 Jul 131998 Jul 16

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume1998-July

Conference

Conference1998 International Microprocesses and Nanotechnology Conference, MNC 1998
CountryKorea, Republic of
CityKyoungju
Period98/7/1398/7/16

Fingerprint

Strain relaxation
Boron

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Nuclear and High Energy Physics
  • Computer Science Applications

Cite this

Oh, M. S., Im, S., Kim, H. B., & Song, J. H. (1998). Effect of boron-implantation on the strain-relaxation of pseudomorphic metastable Ge0.06Si0.94 alloy layers. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 202-203). [730044] (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.730044
Oh, M. S. ; Im, Seongil ; Kim, H. B. ; Song, J. H. / Effect of boron-implantation on the strain-relaxation of pseudomorphic metastable Ge0.06Si0.94 alloy layers. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 202-203 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).
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Oh, MS, Im, S, Kim, HB & Song, JH 1998, Effect of boron-implantation on the strain-relaxation of pseudomorphic metastable Ge0.06Si0.94 alloy layers. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 730044, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 202-203, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 98/7/13. https://doi.org/10.1109/IMNC.1998.730044

Effect of boron-implantation on the strain-relaxation of pseudomorphic metastable Ge0.06Si0.94 alloy layers. / Oh, M. S.; Im, Seongil; Kim, H. B.; Song, J. H.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 202-203 730044 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Oh MS, Im S, Kim HB, Song JH. Effect of boron-implantation on the strain-relaxation of pseudomorphic metastable Ge0.06Si0.94 alloy layers. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 202-203. 730044. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). https://doi.org/10.1109/IMNC.1998.730044