Effect of contact statistics on electrical contact resistance

Yong Hoon Jang, J. R. Barber

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

A model for the electrical contact of rough surfaces, extending Greenwood's equation for conduction through a cluster of circular contacts to a system in which the probability of a contact spot at a given location was defined in statistical term, was presented. An idealized fractal rough surface was defined using the random midpoint displacement algorithm. The size distribution of contact spot was assumed to be given by the intersection of the surface with a constant height plane. It was found that inclusion of the finer scale detail in the fractal surface, equivalent to reducing the sampling length in the measurement of the surface, caused the predicted resistance to approach the perfect contact limit.

Original languageEnglish
Pages (from-to)7215-7221
Number of pages7
JournalJournal of Applied Physics
Volume94
Issue number11
DOIs
Publication statusPublished - 2003 Dec 1

Fingerprint

contact resistance
statistics
fractals
intersections
electric contacts
sampling
inclusions
conduction

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

@article{bf4ec54e810546a3af7b574d110dd468,
title = "Effect of contact statistics on electrical contact resistance",
abstract = "A model for the electrical contact of rough surfaces, extending Greenwood's equation for conduction through a cluster of circular contacts to a system in which the probability of a contact spot at a given location was defined in statistical term, was presented. An idealized fractal rough surface was defined using the random midpoint displacement algorithm. The size distribution of contact spot was assumed to be given by the intersection of the surface with a constant height plane. It was found that inclusion of the finer scale detail in the fractal surface, equivalent to reducing the sampling length in the measurement of the surface, caused the predicted resistance to approach the perfect contact limit.",
author = "Jang, {Yong Hoon} and Barber, {J. R.}",
year = "2003",
month = "12",
day = "1",
doi = "10.1063/1.1622995",
language = "English",
volume = "94",
pages = "7215--7221",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "11",

}

Effect of contact statistics on electrical contact resistance. / Jang, Yong Hoon; Barber, J. R.

In: Journal of Applied Physics, Vol. 94, No. 11, 01.12.2003, p. 7215-7221.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effect of contact statistics on electrical contact resistance

AU - Jang, Yong Hoon

AU - Barber, J. R.

PY - 2003/12/1

Y1 - 2003/12/1

N2 - A model for the electrical contact of rough surfaces, extending Greenwood's equation for conduction through a cluster of circular contacts to a system in which the probability of a contact spot at a given location was defined in statistical term, was presented. An idealized fractal rough surface was defined using the random midpoint displacement algorithm. The size distribution of contact spot was assumed to be given by the intersection of the surface with a constant height plane. It was found that inclusion of the finer scale detail in the fractal surface, equivalent to reducing the sampling length in the measurement of the surface, caused the predicted resistance to approach the perfect contact limit.

AB - A model for the electrical contact of rough surfaces, extending Greenwood's equation for conduction through a cluster of circular contacts to a system in which the probability of a contact spot at a given location was defined in statistical term, was presented. An idealized fractal rough surface was defined using the random midpoint displacement algorithm. The size distribution of contact spot was assumed to be given by the intersection of the surface with a constant height plane. It was found that inclusion of the finer scale detail in the fractal surface, equivalent to reducing the sampling length in the measurement of the surface, caused the predicted resistance to approach the perfect contact limit.

UR - http://www.scopus.com/inward/record.url?scp=0348222282&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0348222282&partnerID=8YFLogxK

U2 - 10.1063/1.1622995

DO - 10.1063/1.1622995

M3 - Article

AN - SCOPUS:0348222282

VL - 94

SP - 7215

EP - 7221

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 11

ER -