Effect of crystal orientations of InGaAs on the surface reactions in acidic solutions

Jihoon Na, Sangwoo Lim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The effect of the various crystal orientations of the InGaAs surface and their constituent elements on the InGaAs surface reactions was investigated from the viewpoints of reaction kinetics and structural characteristics of InGaAs crystal. The etching of the InGaAs in the [100] and [110] directions was observed to be near-isotropic in the acidic solution. However, it was observed that the etching amount along the [-110] direction was less than that along the [110] direction. The etching of the InGaAs in the [001] and [-111] directions was observed to be anisotropic in the acidic solution. It was found that the surface reaction of InGaAs is influenced by both crystal orientation and types of solutions. In addition, it is thought that the surface reactivity and the III-V atomic arrangement of each crystal plane determine the etching characteristics of InGaAs surface.

Original languageEnglish
Title of host publication16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019
EditorsKoichiro Saga, Paul W. Mertens, Takeshi Hattori, Jerzy Ruzyllo, Anthony J. Muscat
PublisherElectrochemical Society Inc.
Pages65-71
Number of pages7
Edition2
ISBN (Electronic)9781607688761
ISBN (Print)9781607688761
DOIs
Publication statusPublished - 2019
Event16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting - Atlanta, United States
Duration: 2019 Oct 132019 Oct 17

Publication series

NameECS Transactions
Number2
Volume92
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

Conference16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting
Country/TerritoryUnited States
CityAtlanta
Period19/10/1319/10/17

Bibliographical note

Funding Information:
This work was supported by the Technology Innovation (20006404, Development of IIIV Semiconductor Channel CMP and Post CMP Cleaning Process) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea). This work was also supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (NRF-2016R1D1A1B03936347).

Publisher Copyright:
© The Electrochemical Society.

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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