Effect of deposition conditions and post treatment of diamond on field emission characteristics

Jae Yeob Shim, Eung Joon Chi, Hong Koo Baik, Kie Moon Song, Sung Man Lee

Research output: Contribution to conferencePaper

Abstract

Diamond films are grown by hot filament chemical vapor deposition with different deposition conditions and implanted with boron and phosphorus ions. Field emission property of diamond films are examined in a ultra high vacuum system. Diamond film with high methane flow ratio exhibits low emission current due to high electron affinity surface. Thick diamond film has poor emission property and it can be attributed to the limit of electron transport path. From the Raman spectra, the boron implanted sample still has a weakened diamond peak with high non-diamond component while the phosphorus implanted sample loses diamond structure. On the other hand, their AES spectra at surface do not exhibit an obvious diamond shoulder, indicating the surface damaged by high dose implantation.

Original languageEnglish
Pages465-469
Number of pages5
Publication statusPublished - 1997
EventProceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97 - Kyongju, Korea
Duration: 1997 Aug 171997 Aug 21

Other

OtherProceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97
CityKyongju, Korea
Period97/8/1797/8/21

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces

Fingerprint Dive into the research topics of 'Effect of deposition conditions and post treatment of diamond on field emission characteristics'. Together they form a unique fingerprint.

  • Cite this

    Shim, J. Y., Chi, E. J., Baik, H. K., Song, K. M., & Lee, S. M. (1997). Effect of deposition conditions and post treatment of diamond on field emission characteristics. 465-469. Paper presented at Proceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97, Kyongju, Korea, .