Effect of elevated annealing temperature on the microstructure and nano-hardness of ZnO films deposited by the sol-gel process

Li Yu Lin; Dae Eun Kim

doi:10.1007/s12541-012-0264-3

Effect of elevated annealing temperature on the microstructure and nano-hardness of ZnO films deposited by the sol-gel process

Li Yu Lin, Dae Eun Kim

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

ZnO films deposited on Si substrates by the sol-gel process were characterized by transmission electron microscopy and energy dispersive X-ray spectroscopy to investigate the effect of annealing temperature (550°C and 800°C) on their microstructures and compositions. When the ZnO film was annealed at a temperature of 800°C, excess Zn atoms was formed in the ZnO film due to the thermal decomposition of ZnO into Zn and O atoms, creating a Zn/ZnO composite film. It was proposed that the excess Zn atoms in the Zn/ZnO composite film may serve to improve the resistance to dislocation motion within the ZnO film, thus increasing the strength of the film. Nanoindentation tests confirmed that the high annealing temperature was beneficial to increase the hardness of the ZnO film.

Original language	English
Pages (from-to)	2005-2009
Number of pages	5
Journal	International Journal of Precision Engineering and Manufacturing
Volume	13
Issue number	11
DOIs	https://doi.org/10.1007/s12541-012-0264-3
Publication status	Published - 2012 Nov

Bibliographical note

Funding Information:
This CRI work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean government (MEST) (No. 2012-0001232).

All Science Journal Classification (ASJC) codes

Mechanical Engineering
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

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10.1007/s12541-012-0264-3

Cite this

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abstract = "ZnO films deposited on Si substrates by the sol-gel process were characterized by transmission electron microscopy and energy dispersive X-ray spectroscopy to investigate the effect of annealing temperature (550°C and 800°C) on their microstructures and compositions. When the ZnO film was annealed at a temperature of 800°C, excess Zn atoms was formed in the ZnO film due to the thermal decomposition of ZnO into Zn and O atoms, creating a Zn/ZnO composite film. It was proposed that the excess Zn atoms in the Zn/ZnO composite film may serve to improve the resistance to dislocation motion within the ZnO film, thus increasing the strength of the film. Nanoindentation tests confirmed that the high annealing temperature was beneficial to increase the hardness of the ZnO film.",

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AU - Lin, Li Yu

AU - Kim, Dae Eun

N1 - Funding Information: This CRI work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean government (MEST) (No. 2012-0001232).

PY - 2012/11

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N2 - ZnO films deposited on Si substrates by the sol-gel process were characterized by transmission electron microscopy and energy dispersive X-ray spectroscopy to investigate the effect of annealing temperature (550°C and 800°C) on their microstructures and compositions. When the ZnO film was annealed at a temperature of 800°C, excess Zn atoms was formed in the ZnO film due to the thermal decomposition of ZnO into Zn and O atoms, creating a Zn/ZnO composite film. It was proposed that the excess Zn atoms in the Zn/ZnO composite film may serve to improve the resistance to dislocation motion within the ZnO film, thus increasing the strength of the film. Nanoindentation tests confirmed that the high annealing temperature was beneficial to increase the hardness of the ZnO film.

AB - ZnO films deposited on Si substrates by the sol-gel process were characterized by transmission electron microscopy and energy dispersive X-ray spectroscopy to investigate the effect of annealing temperature (550°C and 800°C) on their microstructures and compositions. When the ZnO film was annealed at a temperature of 800°C, excess Zn atoms was formed in the ZnO film due to the thermal decomposition of ZnO into Zn and O atoms, creating a Zn/ZnO composite film. It was proposed that the excess Zn atoms in the Zn/ZnO composite film may serve to improve the resistance to dislocation motion within the ZnO film, thus increasing the strength of the film. Nanoindentation tests confirmed that the high annealing temperature was beneficial to increase the hardness of the ZnO film.

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Effect of elevated annealing temperature on the microstructure and nano-hardness of ZnO films deposited by the sol-gel process

Abstract

Bibliographical note

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