Effect of fluorine addition to plasma-enhanced chemical vapor deposition silicon oxide film

S. W. Lim, M. Miyata, T. Naito, Y. Shimogaki, Y. Nakano, K. Tada, H. Komiyama

Research output: Contribution to journalConference articlepeer-review

3 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy