Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH4/O 2/NF3 chemistry

Jae Hong Kim, Chai O. Chung, Dongsun Sheen, Yong Sun Sohn, Hyun Chul Sohn, Jin Woong Kim, Sung Wook Park

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH<sub>4</sub>/O <sub>2</sub>/NF<sub>3</sub> chemistry'. Together they form a unique fingerprint.

Physics & Astronomy