Effect of fluorine on characteristics of shallow trench isolation prepared using high-density plasma chemical vapor deposition including NF3 chemistry

Sung Woong Chung, Chai O. Chung, Sang Don Lee, Hyun Chul Sohn, Ho Yup Kwon, Sung Ju Hong

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Effect of fluorine on characteristics of shallow trench isolation prepared using high-density plasma chemical vapor deposition including NF3 chemistry'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science