Effect of HAc and IPA addition in ozonated water cleaning system for ArF photoresist removal

Jonghyuck Lee, Kibyung Park, Sangwoo Lim

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Fingerprint Dive into the research topics of 'Effect of HAc and IPA addition in ozonated water cleaning system for ArF photoresist removal'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science