Effect of interfacial SiO2−y layer and defect in HfO2−x film on flat-band voltage of HfO2−x/SiO2−y stacks for backside-illuminated CMOS image sensors

Heedo Na, Jimin Lee, Juyoung Jeong, Taeho Kim, Hyunchul Sohn

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2 Citations (Scopus)

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Physics

Material Science