Effect of low pressure remote plasma treatment on damage reduction of emitting organic layer for top-emission organic light-emitting diodes

Deuk Yeon Lee, Hong Koo Baik

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

To study the damage mechanism of an emitting polymer [poly(9,9- dioctylfluorene) (PFO)] during indium tin oxide (ITO) sputtering for top-emission organic light-emitting diodes (TEOLEDs), we treat PFO with low pressure remote RF (LPRF) plasma. The surface energy of PFO is changed by LPRF plasma treatment with the minimum damage condition. By the surface energy control of PFO, the Al metal shows continuous layer growth, which is attributed to the reduction of polymer damage as a buffer layer. From the results of light-current-voltage (L-I-V) characteristics and photoluminescence (PL) measurement, the main factors of polymer damage are both the energetic particles such as Ar neutral atoms and negative ions and the photo oxidation of emitting polymer. We discuss the damage mechanism during sputtering and characterize electronic energy level of the damaged PFO layer.

Original languageEnglish
Pages (from-to)L376-L379
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume45
Issue number12-16
DOIs
Publication statusPublished - 2006

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Effect of low pressure remote plasma treatment on damage reduction of emitting organic layer for top-emission organic light-emitting diodes'. Together they form a unique fingerprint.

  • Cite this