Effect of nitrogen incorporation on electrical properties of high-k nanomixed HfxAlyOz film capacitors grown on Ru metal electrodes by atomic layer deposition

Nak Jin Seong, Soon Gil Yoon, Seung Jin Yeom, Hyun Kyung Woo, Deok Sin Kil, Jae Sung Roh, Hyun Chul Sohn

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1 Citation (Scopus)

Abstract

The HfxAlyOz nanomixed capacitors grown by atomic layer deposition were treated by N2-plasma to improve electrical properties. Especially, leakage current characteristics was studied as a function of rf power and treatment temperature. The dielectric constant of the films was not varied irrespective of an increase of rf power and treatment temperature. The leakage current densities of the films treated by N 2-plasma were effectively influenced by the treatment temperature rather than rf power. The N2-plasma treatment at 300°C and 70 W exhibits the most effective influence on improvement of the leakage current characteristics. The dielectric constant, dielectric loss, and leakage current density at 2.0 V in 6 nm-thick Hf0.27 Al0.24 O 0.49 nanomixed films treated by N2-plasma at 300°C and 70 W were approximately 16, 0.5%, and 2 × 10-6 A/cm 2, respectively.

Original languageEnglish
Pages (from-to)131-136
Number of pages6
JournalIntegrated Ferroelectrics
Volume74
DOIs
Publication statusPublished - 2005
EventSeventeenth International Symposium on Integrated Ferroelectrics, ISIF-17 - Shanghai, China
Duration: 2005 Apr 172005 Apr 20

Bibliographical note

Funding Information:
This work was supported by Korea Research Foundation Grant (KRF-2004-042-D00095), the Brain Korea 21 project in 2005, by Grant No. R01-2003-000-10027-0 from the Korea Science & Engineering Foundation, and by the Korea Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at Chungnam National University.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Control and Systems Engineering
  • Ceramics and Composites
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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