Effect of process conditions on the properties of conductive tracks in direct imprinting and sintering of metal nano-powders

Jiseok Lim, Shinill Kang

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A direct patterning process which uses imprinting and sintering of metal nano-powder to make conductive tracks where sintering was performed during imprinting process was designed. A silicon mold for making conductive tracks was designed and fabricated using photolithography and reactive ion etching (RIE). The effect of process conditions on pattern formation was investigated experimentally. To confirm the feasibility of the direct patterning method as an industrial process, the microstructure and electrical resistivity of the fabricated conductive tracks were analyzed. Various defects were analyzed and based on the analysis, the histories of temperature and pressure were optimized.

Original languageEnglish
Article number125001
JournalJournal of Micromechanics and Microengineering
Volume19
Issue number12
DOIs
Publication statusPublished - 2009 Nov 26

Fingerprint

Powders
Sintering
Metals
Reactive ion etching
Photolithography
Silicon
Defects
Microstructure
Temperature

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Mechanics of Materials
  • Electronic, Optical and Magnetic Materials

Cite this

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