Effect of processing parameters on the formation of large area self-assembled monolayer of polystyrene beads by a convective self-assembly method

Ahn na Seo, Ji Hwan Choi, Jae chul Pyun, Won Mok Kim, Inho Kim, Kyeong Seok Lee

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Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

Original languageEnglish
Pages (from-to)647-654
Number of pages8
JournalKorean Journal of Materials Research
Issue number12
Publication statusPublished - 2015 Jan 1


All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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