Effect of sputtered films on morphology of vertical aligned ZnO nanowires

J. P. Kar, S. W. Lee, W. Lee, J. M. Myoung

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Vertical aligned ZnO nanowires were grown by MOCVD technique on silicon substrate using ZnO and AlN thin films as seed layers. The shape of nanostructures was greatly influenced by the under laying surface. Vertical nanopencils were observed on ZnO/Si, whereas the nanowires on both sapphire and AlN/Si substrate have the similar aspect ratio. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy (HRTEM) confirmed the single crystalline growth of the ZnO nanowires along [0 0 1] direction. Room-temperature photoluminescence (PL) spectra of ZnO nanowires on AlN/Si clearly show a band-edge luminescence accompanied with a visible emission. More interestingly, no visible emission for the nanopencils on ZnO/Si substrates, were observed.

Original languageEnglish
Pages (from-to)6677-6682
Number of pages6
JournalApplied Surface Science
Volume254
Issue number20
DOIs
Publication statusPublished - 2008 Aug 15

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Effect of sputtered films on morphology of vertical aligned ZnO nanowires'. Together they form a unique fingerprint.

  • Cite this