Effect of the Al2O3/SiO2 mass ratio on the crystallization behavior of CaO-SiO2-MgO-Al2O3 slags using confocal laser scanning microscopy

Zhanjun Wang, Il Sohn

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16 Citations (Scopus)


The crystallization behavior of a CaO-SiO2-MgO-Al2O3 slag system with varying Al2O3/SiO2 mass ratios from 0.03 to 1.10 has been investigated using a confocal laser scanning microscopy (CLSM). The resulting continuous cooling transformation (CCT) and time-temperature-transformation (TTT) curves showed that the initial crystallization temperature increased and the incubation time for crystallization slightly decreased with increasing Al2O3/SiO2 ratio. The crystal growth rate first increased and then decreased with decreasing isothermal temperature. X-ray diffraction (XRD) analysis suggested that Ca2MgSi2O7 or Ca3MgSi2O8 precipitated as the primary phase at lower Al2O3/SiO2 ratios, while the Ca2Al2SiO7 phase was preferred at higher Al2O3/SiO2 ratios. The observed crystalline phases correlated well with the expected thermodynamic predictions from FactSage. In addition, structural analysis using 27Al magic angle spinning nuclear magnetic resonance (27Al MAS-NMR) microscopy of the as-quenched slags indicated the presence of a higher ratio of tetrahedral [AlO4]5-structural units with increasing Al2O3/SiO2 ratio, which enhanced the polymerization of tetrahedral [AlO4]5- and [SiO4]4- structural units to form Ca2Al2SiO7.

Original languageEnglish
Pages (from-to)19268-19277
Number of pages10
JournalCeramics International
Issue number16
Publication statusPublished - 2018 Nov

Bibliographical note

Funding Information:
This work was supported by the Brain Korea 21 Plus Project and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning ( 2018R1A2B2006609 ).

Publisher Copyright:
© 2018 Elsevier Ltd and Techna Group S.r.l.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry


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