Effect of the hydration on the properties of an aluminum oxide film

Jin Hyung Jun, Hyo June Kim, Doo Jin Choi

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The properties of Al2O3 films were investigated after dipping the films in DI-water. The thickness of the films did not change due to formation of Al-hydroride layer on their surfaces. After dipping in DI-water, the dielectric constant of the Al2O3 film increased and this seems to be caused by a structural change of the film surface. Using this phenomenon, the overall dielectric constant which includes an Al 2O3 layer can be raised easily through a simple treatment.

Original languageEnglish
Pages (from-to)75-78
Number of pages4
JournalJournal of Ceramic Processing Research
Volume9
Issue number1
Publication statusPublished - 2008 Apr 3

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Aluminum Oxide
Hydration
Oxide films
Aluminum
Permittivity
Water

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites

Cite this

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Effect of the hydration on the properties of an aluminum oxide film. / Jun, Jin Hyung; Kim, Hyo June; Choi, Doo Jin.

In: Journal of Ceramic Processing Research, Vol. 9, No. 1, 03.04.2008, p. 75-78.

Research output: Contribution to journalArticle

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