Effect of water treatment on transparent semiconductor InZnSnO thin films

Joon Chul Moon, Funda Aksoy, Honglyoul Ju, Zhi Liu, Bongjin Simon Mun

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


The effects of water exposure on InZnSnO transparent thin films are reported. After the immersion of InZnSnO films under de-ionized water, an enrichment of In (and Sn) and a reduction of Zn are found on the surface, probed with X-ray photoelectron spectroscopy (XPS). In addition, O 1s core-level XPS spectra show a presence of hydroxyl after the water immersion process, supporting that the adsorption of H2O to InZnSnO surface may induces partial negative charge to surface with either molecular to hydroxyl forms.

Original languageEnglish
Pages (from-to)513-516
Number of pages4
JournalCurrent Applied Physics
Issue number3
Publication statusPublished - 2011 May

Bibliographical note

Funding Information:
This work was supported by the research fund of Hanyang University ( HY-20090546-N )

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Physics and Astronomy(all)


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