Effect of water treatment on transparent semiconductor InZnSnO thin films

Joon Chul Moon, Funda Aksoy, Honglyoul Ju, Zhi Liu, Bongjin Simon Mun

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The effects of water exposure on InZnSnO transparent thin films are reported. After the immersion of InZnSnO films under de-ionized water, an enrichment of In (and Sn) and a reduction of Zn are found on the surface, probed with X-ray photoelectron spectroscopy (XPS). In addition, O 1s core-level XPS spectra show a presence of hydroxyl after the water immersion process, supporting that the adsorption of H2O to InZnSnO surface may induces partial negative charge to surface with either molecular to hydroxyl forms.

Original languageEnglish
Pages (from-to)513-516
Number of pages4
JournalCurrent Applied Physics
Volume11
Issue number3
DOIs
Publication statusPublished - 2011 May 1

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Effect of water treatment on transparent semiconductor InZnSnO thin films'. Together they form a unique fingerprint.

  • Cite this