Effect of wire temperature on the microstructural evolution of Si films in hot-wire chemical vapor deposition for digital display and photovoltaic devices

Jean Ho Song, Byung Du Ahn, Seung Doh Shin, Nong Moon Hwang, Hyun Jae Kim

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3 Citations (Scopus)


The formation of crystalline phase in Si by hot-wire chemical vapor deposition (HWCVD) was investigated, focusing on the microstructural evolution as a function of hot-wire temperature. The microstructure of films deposited on a Si wafer was compared between hot-wire temperatures of 1590, 1670, and 1800 °C. A heavily twinned structure was observed at the wire temperature of 1670 °C, which resulted in the apparent intensity peak of (1 1 1) hexagonal-closed packed (HCP) crystalline Si from a typical face-centered cubic (FCC) crystalline Si structure in the X-ray diffraction analysis. The twin-related HCP crystalline phase was markedly diminished at 1800 °C and hardly observed at 1590 °C. The observed deposition behavior was approached by the effect of the wire temperature on the size of charged nanoparticles formed in the gas phase in the HWCVD process.

Original languageEnglish
Pages (from-to)324-328
Number of pages5
JournalSolar Energy Materials and Solar Cells
Issue number3
Publication statusPublished - 2009 Mar 1


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

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