Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films

Jin Yong Kim, Yong June Choi, Hyung-Ho Park, Stephen Golledge, David C. Johnson

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

A zinc-metal dopant-oxygen precursor exposure cycle is demonstrated as a modified deposition procedure for better distribution of Al-dopants in ZnO films by atomic layer deposition with the aim to reduce the formation of nanolaminate thin films that might form with the typically used alternating ZnO and metal oxide deposition procedure. The distribution and chemical bonding states of Al-dopants were studied with various dopant deposition intervals of Zn-Al-O precursor and Zn-O cycles at 1::4, 1::9, 1::14, and 1::19 ratios. The smallest resistivity of Al-doped ZnO film without degradation of transparency was obtained at 250 °C with 5.37× 10 -4 Ωcm.

Original languageEnglish
Pages (from-to)1111-1114
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume28
Issue number5
DOIs
Publication statusPublished - 2010 Sep 1

Fingerprint

Atomic layer deposition
atomic layer epitaxy
Doping (additives)
Thin films
thin films
cycles
Metals
metal oxides
zinc
Transparency
Oxides
degradation
intervals
Zinc
electrical resistivity
oxides
oxygen
Oxygen
Degradation
metals

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Kim, Jin Yong ; Choi, Yong June ; Park, Hyung-Ho ; Golledge, Stephen ; Johnson, David C. / Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2010 ; Vol. 28, No. 5. pp. 1111-1114.
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Effective atomic layer deposition procedure for Al-dopant distribution in ZnO thin films. / Kim, Jin Yong; Choi, Yong June; Park, Hyung-Ho; Golledge, Stephen; Johnson, David C.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 28, No. 5, 01.09.2010, p. 1111-1114.

Research output: Contribution to journalArticle

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