Effective work function lowering of multilayer graphene films by subnanometer thick AlOx overlayers

Yeonjin Yi, Won Mook Choi, Yoon Hak Kim, Jeong Won Kim, Seong Jun Kang

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30 Citations (Scopus)

Abstract

A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick.

Original languageEnglish
Article number013505
JournalApplied Physics Letters
Volume98
Issue number1
DOIs
Publication statusPublished - 2011 Jan 3

Bibliographical note

Funding Information:
This work was supported by a research project of the National Research Foundation of Korea (Grant Nos. 2010-0015727, 2010-0003009, and 2010-0010007), by the Korea Research Council of Fundamental Science and Technology, and by the GRRC program of Gyeonggi province (GRRC Kyung Hee 2010-B07).

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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