Effects of nitrogen addition on the structure and field emission properties of amorphous carbon

Eung Joon Chi, Jae Yeob Shim, Hong Koo Baik

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The films of amorphous carbon with different amounts of incorporated nitrogen are deposited by helical resonator plasma enhanced chemical vapor deposition using CH4, Ar, and N2 gas mixtures. As the nitrogen content in the films increases, the optical band gap and sp3 bond fraction decreased. The higher field emission current and the lower turn-on voltage are obtained from the sample of the higher nitrogen content. The calculated emission barrier heights for a-C:N (5/5) and (10/0) are 0.76 and 0.70 times that for a-C, respectively. The increase of the conducting part of the films and the role of nitrogen as an electrical donor are responsible for the enhanced field emission.

Original languageEnglish
Pages (from-to)728-730
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume17
Issue number2
Publication statusPublished - 1999 Dec 1

Fingerprint

Amorphous carbon
Field emission
field emission
Nitrogen
nitrogen
carbon
Optical band gaps
Plasma enhanced chemical vapor deposition
Gas mixtures
gas mixtures
Resonators
resonators
vapor deposition
conduction
Electric potential
electric potential

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

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Effects of nitrogen addition on the structure and field emission properties of amorphous carbon. / Chi, Eung Joon; Shim, Jae Yeob; Baik, Hong Koo.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 17, No. 2, 01.12.1999, p. 728-730.

Research output: Contribution to journalArticle

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