Effects of phase of underlying W film on chemical vapor deposited-W film growth and applications to contact-plug and bit line processes for memory devices

Soo Hyun Kim, Jeong Tae Kim, Nohjung Kwak, Jinwoong Kim, Tae Sik Yoon, Hyunchul Sohn

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy