Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores

Engineering & Materials Science

• Self assembly 100%
• Silica 78%
• Evaporation 76%
• X ray diffraction 74%
• Thin films 72%
• Vapors 68%
• Spin coating 56%
• Polymers 55%
• Diffraction patterns 54%
• Hydrophobicity 49%
• Calcination 48%
• Phase diagrams 48%
• Leakage currents 40%
• Infrared radiation 32%
• Silicon 29%
• Substrates 26%
• Geometry 23%

Physics & Astronomy

• bromides 88%
• self assembly 79%
• silicon dioxide 58%
• evaporation 58%
• vapors 57%
• porosity 55%
• hydrophobicity 46%
• thin films 39%
• metal spinning 37%
• infrared spectra 36%
• coating 34%
• x rays 34%
• diffraction patterns 31%
• leakage 31%
• phase diagrams 29%
• geometry 21%
• silicon 20%
• diffraction 20%

Chemistry

• Mesophase 81%
• Pore 50%
• Leakage Current 33%
• Silanol 28%
• Cetyltrimethylammonium Bromide 26%
• Spin Coating 26%
• X-Ray Diffraction 25%
• Phase Diagrams 23%
• Dielectric Material 22%
• Hydrophobicity 21%
• Calcination 21%
• Space Group 18%
• Time 9%
• Application 8%