Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films

Hyeong Ho Park, Tae Jung Ha, Hyung-Ho Park, Tae Song Kim, Ross H. Hill

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.

Original languageEnglish
Pages (from-to)4143-4145
Number of pages3
JournalMaterials Letters
Volume62
Issue number25
DOIs
Publication statusPublished - 2008 Sep 30

Fingerprint

Ferroelectric materials
Metals
Irradiation
irradiation
metals
Dry etching
Fourier transform infrared spectroscopy
infrared spectroscopy
etching
Annealing
Polarization
annealing
augmentation
room temperature
polarization
Temperature

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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title = "Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films",
abstract = "The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.",
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Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films. / Park, Hyeong Ho; Ha, Tae Jung; Park, Hyung-Ho; Kim, Tae Song; Hill, Ross H.

In: Materials Letters, Vol. 62, No. 25, 30.09.2008, p. 4143-4145.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films

AU - Park, Hyeong Ho

AU - Ha, Tae Jung

AU - Park, Hyung-Ho

AU - Kim, Tae Song

AU - Hill, Ross H.

PY - 2008/9/30

Y1 - 2008/9/30

N2 - The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.

AB - The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.

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