Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films

Hyeong Ho Park; Tae Jung Ha; Hyung Ho Park; Tae Song Kim; Ross H. Hill

doi:10.1016/j.matlet.2008.06.027

Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi_3.25La_0.75Ti₃O₁₂ films

Hyeong Ho Park, Tae Jung Ha, Hyung Ho Park, Tae Song Kim, Ross H. Hill

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi_3.25La_0.75Ti₃O₁₂ (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm², respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.

Original language	English
Pages (from-to)	4143-4145
Number of pages	3
Journal	Materials Letters
Volume	62
Issue number	25
DOIs	https://doi.org/10.1016/j.matlet.2008.06.027
Publication status	Published - 2008 Sept 30

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1016/j.matlet.2008.06.027

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title = "Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films",

abstract = "The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.",

author = "Park, {Hyeong Ho} and Ha, {Tae Jung} and Park, {Hyung Ho} and Kim, {Tae Song} and Hill, {Ross H.}",

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T1 - Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi3.25La0.75Ti3O12 films

AU - Park, Hyeong Ho

AU - Ha, Tae Jung

AU - Park, Hyung Ho

AU - Kim, Tae Song

AU - Hill, Ross H.

PY - 2008/9/30

Y1 - 2008/9/30

N2 - The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.

AB - The electric and ferroelectric properties of UV-irradiated and non-irradiated Bi3.25La0.75Ti3O12 (BLT) films prepared by photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through ultraviolet exposure of the spin-coated BLT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated BLT films after annealing at 700 °C were 16.0 and 10.1 μC/cm2, respectively. The process of UV-irradiation was effective for the enhancement of electric and ferroelectric properties, as well as direct-patterning to fabricate micro-patterned systems without dry etching.

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Effects of UV-irradiation during photochemical metal-organic deposition on the electric and ferroelectric properties of direct-patternable Bi_3.25La_0.75Ti₃O₁₂ films

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