Effects of ZnO buffer layer thickness on properties of ZnO thin films deposited by radio-frequency magnetron sputtering

Kyu Hyun Bang, Deuk Kyu Hwang, Jae Min Myoung

Research output: Contribution to journalArticle

92 Citations (Scopus)

Abstract

A series of ZnO films were deposited on c-plane sapphire substrates having different buffer layer thicknesses between 50 and 500 Å by radio-frequency (rf) magnetron sputtering. Scanning electron microscopy (SEM) was utilized to investigate the surface morphology of ZnO films. The crystallinity of ZnO films was investigated by the double-crystal X-ray diffractometry (DCXRD). The optical properties of ZnO films were also investigated using low-temperature (LT) photoluminescence (PL). It was found that the surface morphology, structural and optical properties of the films depended on the thickness of the buffer layer. The films deposited on the 100 Å thick ZnO buffer layer exhibit the good structural and optical properties with a very smooth surface.

Original languageEnglish
Pages (from-to)359-364
Number of pages6
JournalApplied Surface Science
Volume207
Issue number1-4
DOIs
Publication statusPublished - 2003 Feb 28

Fingerprint

Buffer layers
Magnetron sputtering
radio frequencies
magnetron sputtering
buffers
Thin films
thin films
Optical properties
optical properties
Surface morphology
Structural properties
Aluminum Oxide
Sapphire
X ray diffraction analysis
crystallinity
Photoluminescence
sapphire
photoluminescence
Crystals
Scanning electron microscopy

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

@article{66653ede39f74589b3fc6cfaca01e918,
title = "Effects of ZnO buffer layer thickness on properties of ZnO thin films deposited by radio-frequency magnetron sputtering",
abstract = "A series of ZnO films were deposited on c-plane sapphire substrates having different buffer layer thicknesses between 50 and 500 {\AA} by radio-frequency (rf) magnetron sputtering. Scanning electron microscopy (SEM) was utilized to investigate the surface morphology of ZnO films. The crystallinity of ZnO films was investigated by the double-crystal X-ray diffractometry (DCXRD). The optical properties of ZnO films were also investigated using low-temperature (LT) photoluminescence (PL). It was found that the surface morphology, structural and optical properties of the films depended on the thickness of the buffer layer. The films deposited on the 100 {\AA} thick ZnO buffer layer exhibit the good structural and optical properties with a very smooth surface.",
author = "Bang, {Kyu Hyun} and Hwang, {Deuk Kyu} and Myoung, {Jae Min}",
year = "2003",
month = "2",
day = "28",
doi = "10.1016/S0169-4332(03)00005-9",
language = "English",
volume = "207",
pages = "359--364",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "1-4",

}

Effects of ZnO buffer layer thickness on properties of ZnO thin films deposited by radio-frequency magnetron sputtering. / Bang, Kyu Hyun; Hwang, Deuk Kyu; Myoung, Jae Min.

In: Applied Surface Science, Vol. 207, No. 1-4, 28.02.2003, p. 359-364.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effects of ZnO buffer layer thickness on properties of ZnO thin films deposited by radio-frequency magnetron sputtering

AU - Bang, Kyu Hyun

AU - Hwang, Deuk Kyu

AU - Myoung, Jae Min

PY - 2003/2/28

Y1 - 2003/2/28

N2 - A series of ZnO films were deposited on c-plane sapphire substrates having different buffer layer thicknesses between 50 and 500 Å by radio-frequency (rf) magnetron sputtering. Scanning electron microscopy (SEM) was utilized to investigate the surface morphology of ZnO films. The crystallinity of ZnO films was investigated by the double-crystal X-ray diffractometry (DCXRD). The optical properties of ZnO films were also investigated using low-temperature (LT) photoluminescence (PL). It was found that the surface morphology, structural and optical properties of the films depended on the thickness of the buffer layer. The films deposited on the 100 Å thick ZnO buffer layer exhibit the good structural and optical properties with a very smooth surface.

AB - A series of ZnO films were deposited on c-plane sapphire substrates having different buffer layer thicknesses between 50 and 500 Å by radio-frequency (rf) magnetron sputtering. Scanning electron microscopy (SEM) was utilized to investigate the surface morphology of ZnO films. The crystallinity of ZnO films was investigated by the double-crystal X-ray diffractometry (DCXRD). The optical properties of ZnO films were also investigated using low-temperature (LT) photoluminescence (PL). It was found that the surface morphology, structural and optical properties of the films depended on the thickness of the buffer layer. The films deposited on the 100 Å thick ZnO buffer layer exhibit the good structural and optical properties with a very smooth surface.

UR - http://www.scopus.com/inward/record.url?scp=0037470498&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037470498&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(03)00005-9

DO - 10.1016/S0169-4332(03)00005-9

M3 - Article

AN - SCOPUS:0037470498

VL - 207

SP - 359

EP - 364

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 1-4

ER -