Electric Control over 2D Dirac Plasmon Resonances in Topological Insulator Bi2Se3 in Proximity Contact with Graphene

Chihun In, Beom Kim, Jisoo Moon, Seung Young Seo, Woosun Jang, Hyunseung Jung, Myungwoo Son, Seongshik Oh, Aloysius Soon, Hojin Lee, Moon Ho Ham, Hyunyong Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Graphene and topological insulator (TI) host two-dimensional (2D) Dirac surface plasmon at the terahertz frequency range. We observed unconventional density-dependence of 2D topological Dirac plasmon upon in nproximity to the mono layer graphene.

Original languageEnglish
Title of host publication2019 Conference on Lasers and Electro-Optics, CLEO 2019 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580576
DOIs
Publication statusPublished - 2019 May
Event2019 Conference on Lasers and Electro-Optics, CLEO 2019 - San Jose, United States
Duration: 2019 May 52019 May 10

Publication series

Name2019 Conference on Lasers and Electro-Optics, CLEO 2019 - Proceedings

Conference

Conference2019 Conference on Lasers and Electro-Optics, CLEO 2019
CountryUnited States
CitySan Jose
Period19/5/519/5/10

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Spectroscopy
  • Industrial and Manufacturing Engineering
  • Safety, Risk, Reliability and Quality
  • Management, Monitoring, Policy and Law
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

In, C., Kim, B., Moon, J., Seo, S. Y., Jang, W., Jung, H., Son, M., Oh, S., Soon, A., Lee, H., Ham, M. H., & Choi, H. (2019). Electric Control over 2D Dirac Plasmon Resonances in Topological Insulator Bi2Se3 in Proximity Contact with Graphene. In 2019 Conference on Lasers and Electro-Optics, CLEO 2019 - Proceedings [8749185] (2019 Conference on Lasers and Electro-Optics, CLEO 2019 - Proceedings). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.23919/CLEO.2019.8749185