Electrical properties in high-k HfO2 capacitors with an equivalent oxide thickness of 9 Å on ru metal electrode

Jeon Ho Kim, Soon Gil Yoon, Seung Jin Yeom, Hyun Kyung Woo, Deok Sin Kil, Jae Sung Roh, Hyun Chul Sohn

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Electrical properties in high-k HfO<sub>2</sub> capacitors with an equivalent oxide thickness of 9 Å on ru metal electrode'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds