Electrodeposition of monodisperse copper nanoparticles on highly oriented pyrolytic graphite electrode with modulation potential method

Ling Huang, Eun Sung Lee, Kwang Bum Kim

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Abstract

Copper nanoparticles with size of 51 nm and R.S.D.dia of 10% can be obtained by modulation potential electrodeposition: first, a -0.8 V × 120 ms potential step was used to nucleate copper particles on highly oriented pyrolytic graphite (HOPG) electrode surface, where nuclei with a supercritical size were formed, secondly, a 0.082 V × 80 ms strip peak potential (E s) was used to strip smaller metal nuclei partly, at last, a growth potential, -0.28 V was applied to grow the nearly identical size slowly. Mechanism of copper electrodeposition on HOPG electrode from a solution of 1 mM CuSO4 and 1.0 M H2SO4 has been studied using cyclic voltammogram and chronoamperometry. In copper electrodeposition the charge-transfer step is fast and the rate of growth is controlled by the rate of mass transfer of copper ions to the growing centers. Reduction of Cu(II) ions did not undergo underpotential deposition. The initial deposition kinetics of Cu electrocrystallization corresponds to a model including progressive nucleation and diffusion controlled growth.

Original languageEnglish
Pages (from-to)125-131
Number of pages7
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume262
Issue number1-3
DOIs
Publication statusPublished - 2005 Jul 15

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Graphite electrodes
pyrolytic graphite
Electrodeposition
electrodeposition
Copper
Modulation
Nanoparticles
modulation
copper
nanoparticles
electrodes
strip
Ions
Chronoamperometry
nuclei
mass transfer
Charge transfer
ions
Nucleation
Mass transfer

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

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title = "Electrodeposition of monodisperse copper nanoparticles on highly oriented pyrolytic graphite electrode with modulation potential method",
abstract = "Copper nanoparticles with size of 51 nm and R.S.D.dia of 10{\%} can be obtained by modulation potential electrodeposition: first, a -0.8 V × 120 ms potential step was used to nucleate copper particles on highly oriented pyrolytic graphite (HOPG) electrode surface, where nuclei with a supercritical size were formed, secondly, a 0.082 V × 80 ms strip peak potential (E s) was used to strip smaller metal nuclei partly, at last, a growth potential, -0.28 V was applied to grow the nearly identical size slowly. Mechanism of copper electrodeposition on HOPG electrode from a solution of 1 mM CuSO4 and 1.0 M H2SO4 has been studied using cyclic voltammogram and chronoamperometry. In copper electrodeposition the charge-transfer step is fast and the rate of growth is controlled by the rate of mass transfer of copper ions to the growing centers. Reduction of Cu(II) ions did not undergo underpotential deposition. The initial deposition kinetics of Cu electrocrystallization corresponds to a model including progressive nucleation and diffusion controlled growth.",
author = "Ling Huang and Lee, {Eun Sung} and Kim, {Kwang Bum}",
year = "2005",
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T1 - Electrodeposition of monodisperse copper nanoparticles on highly oriented pyrolytic graphite electrode with modulation potential method

AU - Huang, Ling

AU - Lee, Eun Sung

AU - Kim, Kwang Bum

PY - 2005/7/15

Y1 - 2005/7/15

N2 - Copper nanoparticles with size of 51 nm and R.S.D.dia of 10% can be obtained by modulation potential electrodeposition: first, a -0.8 V × 120 ms potential step was used to nucleate copper particles on highly oriented pyrolytic graphite (HOPG) electrode surface, where nuclei with a supercritical size were formed, secondly, a 0.082 V × 80 ms strip peak potential (E s) was used to strip smaller metal nuclei partly, at last, a growth potential, -0.28 V was applied to grow the nearly identical size slowly. Mechanism of copper electrodeposition on HOPG electrode from a solution of 1 mM CuSO4 and 1.0 M H2SO4 has been studied using cyclic voltammogram and chronoamperometry. In copper electrodeposition the charge-transfer step is fast and the rate of growth is controlled by the rate of mass transfer of copper ions to the growing centers. Reduction of Cu(II) ions did not undergo underpotential deposition. The initial deposition kinetics of Cu electrocrystallization corresponds to a model including progressive nucleation and diffusion controlled growth.

AB - Copper nanoparticles with size of 51 nm and R.S.D.dia of 10% can be obtained by modulation potential electrodeposition: first, a -0.8 V × 120 ms potential step was used to nucleate copper particles on highly oriented pyrolytic graphite (HOPG) electrode surface, where nuclei with a supercritical size were formed, secondly, a 0.082 V × 80 ms strip peak potential (E s) was used to strip smaller metal nuclei partly, at last, a growth potential, -0.28 V was applied to grow the nearly identical size slowly. Mechanism of copper electrodeposition on HOPG electrode from a solution of 1 mM CuSO4 and 1.0 M H2SO4 has been studied using cyclic voltammogram and chronoamperometry. In copper electrodeposition the charge-transfer step is fast and the rate of growth is controlled by the rate of mass transfer of copper ions to the growing centers. Reduction of Cu(II) ions did not undergo underpotential deposition. The initial deposition kinetics of Cu electrocrystallization corresponds to a model including progressive nucleation and diffusion controlled growth.

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