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Electronic structure and thermal stability of nitrided Hf silicate films using a direct N plasma
M. H. Cho
, K. B. Chung, D. W. Moon
Department of Physics
Research output
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Contribution to journal
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Article
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peer-review
24
Citations (Scopus)
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Material Science
Liquid Films
100%
Thermal Stability
50%
Silicate
37%
Annealing
25%
Electronic Structure
25%
Chemical State
12%