Electrostatic scanning micromirrors using localized plastic deformation of silicon

Jongbaeg Kim, Liwei Lin

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

Electrostatic scanning micromirrors made of single-crystal silicon from a SOI (silicon-on-insulator) wafer using self-aligned and localized plastic deformation of silicon have been demonstrated. Localized plastic deformation is achieved by selective Joule heating of silicon structures while the whole substrate is kept at low temperature. Novel designs for torsional springs to prevent the buckling problem due to the non-uniform thermal expansion by localized heating are presented and the optimal range of electric power for successful Joule heating is discussed. The prototype micromirror is actuated by self-aligned vertical comb sets at a measured resonant frequency of 4.13 kHz with optical scanning angles up to 50.9°under driving voltages of 30 V dc plus 14 Vac. After continuous operation of 20 billion cycles (56 days) at the maximum scanning angle, the device shows no observable signs of degradation or fatigue.

Original languageEnglish
Pages (from-to)1777-1785
Number of pages9
JournalJournal of Micromechanics and Microengineering
Volume15
Issue number9
DOIs
Publication statusPublished - 2005 Sep 1

Fingerprint

Silicon
Electrostatics
Plastic deformation
Scanning
Joule heating
Buckling
Thermal expansion
Natural frequencies
Single crystals
Fatigue of materials
Heating
Degradation
Electric potential
Substrates
Temperature

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

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Electrostatic scanning micromirrors using localized plastic deformation of silicon. / Kim, Jongbaeg; Lin, Liwei.

In: Journal of Micromechanics and Microengineering, Vol. 15, No. 9, 01.09.2005, p. 1777-1785.

Research output: Contribution to journalArticle

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