The electronic structures of tris(8-hydroquinoline) aluminum (Al q3) 8 -hydroquinolatolithium (Liq)/Al interfaces were studied using in situ ultraviolet and x-ray photoelectron spectroscopy. We constructed complete energy level diagrams and analyzed chemical interactions at the interface. When Liq was inserted between Al and Al q3, the electron injection barrier was reduced by 0.56 eV compared to the structure without Liq. Additionally, a gap state was observed in the gap of Liq, which is related to an interfacial reaction. The N 1s spectra revealed that there were destructive chemical reactions between Al q3 and Al, which could be prevented by inserting Liq between them.
Bibliographical noteFunding Information:
This work was supported by The Institute of Physics and Applied Physics (IPAP), Yonsei University, and BK21 project of the Korea Research Foundation (KRF).
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)