Enhanced air-gap control for high-speed plasmonic lithography

Hyunwoo Hwang, Won Sup Lee, No Cheol Park, Young Pil Park, Kyoung Su Park, Hyunseok Yang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011
Pages927-928
Number of pages2
Publication statusPublished - 2011 Dec 1
EventASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011 - Denver, CO, United States
Duration: 2011 Nov 112011 Nov 17

Publication series

NameASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011
Volume1

Other

OtherASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011
CountryUnited States
CityDenver, CO
Period11/11/1111/11/17

Fingerprint

Lithography
Air

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Cite this

Hwang, H., Lee, W. S., Park, N. C., Park, Y. P., Park, K. S., & Yang, H. (2011). Enhanced air-gap control for high-speed plasmonic lithography. In ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011 (pp. 927-928). (ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011; Vol. 1).
Hwang, Hyunwoo ; Lee, Won Sup ; Park, No Cheol ; Park, Young Pil ; Park, Kyoung Su ; Yang, Hyunseok. / Enhanced air-gap control for high-speed plasmonic lithography. ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011. 2011. pp. 927-928 (ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011).
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year = "2011",
month = "12",
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language = "English",
isbn = "9780791854877",
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Hwang, H, Lee, WS, Park, NC, Park, YP, Park, KS & Yang, H 2011, Enhanced air-gap control for high-speed plasmonic lithography. in ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011. ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011, vol. 1, pp. 927-928, ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011, Denver, CO, United States, 11/11/11.

Enhanced air-gap control for high-speed plasmonic lithography. / Hwang, Hyunwoo; Lee, Won Sup; Park, No Cheol; Park, Young Pil; Park, Kyoung Su; Yang, Hyunseok.

ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011. 2011. p. 927-928 (ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011; Vol. 1).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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AU - Yang, Hyunseok

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Hwang H, Lee WS, Park NC, Park YP, Park KS, Yang H. Enhanced air-gap control for high-speed plasmonic lithography. In ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011. 2011. p. 927-928. (ASME 2011 International Mechanical Engineering Congress and Exposition, IMECE 2011).