Enhanced light output from the nano-patterned InP semiconductor substrate through the nanoporous alumina mask

Mi Jung, Jae Hun Kim, Seok Lee, Byung Jin Jang, Woo Young Lee, Yoo Mi Oh, Sun Woo Park, Deokha Woo

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A signi?cant enhancement in the light output from nano-patterned InP substrate covered with a nanoporous alumina mask was observed. A uniform nanohole array on an InP semiconductor substrate was fabricated by inductively coupled plasma reactive ion etching (ICP-RIE), using the nanoporous alumina mask as a shadow mask. The light output property of the semiconductor substrate was investigated via photoluminescence (PL) intensity measurement. The InP substrate with a nanohole array showed a more enhanced PL intensity compared with the raw InP substrate without a nanohole structure. After ICP-RIE etching, the light output from the nanoporous InP substrate covered with a nanoporous alumina mask showed fourfold enhanced PL intensity compared with the raw InP substrate. These results can be used as a prospective method for increasing the light output ef?ciency of optoelectronic devices.

Original languageEnglish
Pages (from-to)5747-5753
Number of pages7
JournalJournal of Nanoscience and Nanotechnology
Volume12
Issue number7
DOIs
Publication statusPublished - 2012 Jul 1

Fingerprint

Semiconductors
Aluminum Oxide
Masks
Alumina
masks
aluminum oxides
Semiconductor materials
Light
output
Substrates
Photoluminescence
Ions
Plasma etching
Reactive ion etching
etching
Inductively coupled plasma
photoluminescence
Equipment and Supplies
optoelectronic devices
Optoelectronic devices

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Jung, Mi ; Kim, Jae Hun ; Lee, Seok ; Jang, Byung Jin ; Lee, Woo Young ; Oh, Yoo Mi ; Park, Sun Woo ; Woo, Deokha. / Enhanced light output from the nano-patterned InP semiconductor substrate through the nanoporous alumina mask. In: Journal of Nanoscience and Nanotechnology. 2012 ; Vol. 12, No. 7. pp. 5747-5753.
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abstract = "A signi?cant enhancement in the light output from nano-patterned InP substrate covered with a nanoporous alumina mask was observed. A uniform nanohole array on an InP semiconductor substrate was fabricated by inductively coupled plasma reactive ion etching (ICP-RIE), using the nanoporous alumina mask as a shadow mask. The light output property of the semiconductor substrate was investigated via photoluminescence (PL) intensity measurement. The InP substrate with a nanohole array showed a more enhanced PL intensity compared with the raw InP substrate without a nanohole structure. After ICP-RIE etching, the light output from the nanoporous InP substrate covered with a nanoporous alumina mask showed fourfold enhanced PL intensity compared with the raw InP substrate. These results can be used as a prospective method for increasing the light output ef?ciency of optoelectronic devices.",
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Enhanced light output from the nano-patterned InP semiconductor substrate through the nanoporous alumina mask. / Jung, Mi; Kim, Jae Hun; Lee, Seok; Jang, Byung Jin; Lee, Woo Young; Oh, Yoo Mi; Park, Sun Woo; Woo, Deokha.

In: Journal of Nanoscience and Nanotechnology, Vol. 12, No. 7, 01.07.2012, p. 5747-5753.

Research output: Contribution to journalArticle

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