Abstract
We report on the fabrication of rubrene thin-film transistors (TFTs) with spin-coated poly-4-vinylphenol (PVP) dielectric on indium-tin oxide/plastic substrate. Under a specific growth condition of 80°C in situ vacuum anneal following thermal deposition, initial amorphous rubrene film was successfully transformed into crystalline phase, both on hydrophobic PVP and on Si O2 p+ -Si substrate, whose surface is relatively hydrophilic. The transformation or growth kinetics of the crystalline rubrene domain was much faster on PVP than on the Si O2 gate dielectric. As a result, the rubrene TFT with PVP dielectric exhibited an order of magnitude higher field mobility (∼6× 10-3 cm2 V s) than that of the other one with Si O2 dielectric.
Original language | English |
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Pages (from-to) | 321-323 |
Number of pages | 3 |
Journal | Electrochemical and Solid-State Letters |
Volume | 10 |
Issue number | 11 |
DOIs | |
Publication status | Published - 2007 |
All Science Journal Classification (ASJC) codes
- Chemical Engineering(all)
- Materials Science(all)
- Physical and Theoretical Chemistry
- Electrochemistry
- Electrical and Electronic Engineering