Enhancing marker-based AR technology

Jonghoon Seo, Jinwook Shim, Ji Hye Choi, James Park, Tack Don Han

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Citations (Scopus)

Abstract

In this paper, we propose a method that solves both jittering and occlusion problems which is the biggest issue in marker based augmented reality technology. Because we adjust the pose estimation by using multiple keypoints that exist in the marker based on cells, we can predict the strong pose on jittering. Additionally, we can solve the occlusion problem by applying tracking technology.

Original languageEnglish
Title of host publicationVirtual and Mixed Reality - New Trends - International Conference, Virtual and Mixed Reality 2011, Held as Part of HCI International 2011, Proceedings
Pages97-104
Number of pages8
EditionPART 1
DOIs
Publication statusPublished - 2011 Jul 21
Event4th International Conference on Virtual and Mixed Reality, Held as Part of HCI International 2011 - Orlando, FL, United States
Duration: 2011 Jul 92011 Jul 14

Publication series

NameLecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)
NumberPART 1
Volume6773 LNCS
ISSN (Print)0302-9743
ISSN (Electronic)1611-3349

Other

Other4th International Conference on Virtual and Mixed Reality, Held as Part of HCI International 2011
CountryUnited States
CityOrlando, FL
Period11/7/911/7/14

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All Science Journal Classification (ASJC) codes

  • Theoretical Computer Science
  • Computer Science(all)

Cite this

Seo, J., Shim, J., Choi, J. H., Park, J., & Han, T. D. (2011). Enhancing marker-based AR technology. In Virtual and Mixed Reality - New Trends - International Conference, Virtual and Mixed Reality 2011, Held as Part of HCI International 2011, Proceedings (PART 1 ed., pp. 97-104). (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); Vol. 6773 LNCS, No. PART 1). https://doi.org/10.1007/978-3-642-22021-0_12