Boron ion implantation for edge termination of Au/n-Si Schottky diode has been studied to enhance the breakdown voltages of the diodes. Ion energies of 30 and 50 keV were adopted to achieve edge-terminated Schottky diodes. Four doses of 1 × 1013, 1 × 1014, 1 × 1015 and 1 × 1016 B cm-2 were used for each energy. The Schottky diodes with edge termination show much higher breakdown voltages than the diodes without edge termination if the ion dose is controlled. For instance the diodes treated with low doses achieve high breakdown voltages while the diodes with high doses of 1 × 1015 and 1 × 1016 B cm-2 easily fail at low voltages showing early breakdown and high current leakage. According to the results from current-voltage (I-V), the current leakage is reasoned to result from deep level defects introduced by B ion implantation and the leakage at a reverse bias of -40 V is maintained low up to an elevated temperature of 160°C.
|Number of pages||5|
|Journal||Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms|
|Publication status||Published - 2000 Jul|
Bibliographical noteFunding Information:
This work is supported by ’98 Yonsei University Research Funds.
All Science Journal Classification (ASJC) codes
- Nuclear and High Energy Physics