X-ray and ultraviolet photoelectron spectroscopies (XPS and UPS) were used to characterize as-deposited epitaxial TiN(001) layers grown in situ. The films were deposited by ultrahigh vacuum reactive magnetron sputtering on MgO(001) at 850 °C in pure N2 discharges maintained at a pressure of 5 mTorr (0.67 Pa). Mg Kα and monochromatic Al Kα x-ray sources were used to obtain the XPS spectra, while the UPS data was generated by He I and He II UV radiation. The spectra show that the TiN(001) surfaces are free of O and C. The films were found to be stoichiometric in agreement with Rutherford backscattering spectroscopy (RBS) results, yielding a N/Ti ratio of 1.02 ± 0.02.
|Number of pages||11|
|Journal||Surface Science Spectra|
|Publication status||Published - 2000 Jul 1|
Bibliographical noteFunding Information:
The authors gratefully acknowledge the financial support of the Department of Energy, under Contract No. DEFG02-96-ER45439 and the use of the facilities of the Center for Microanalysis of Materials, which is partially supported by DOE, at the University of Illinois.
© 2000 American Vacuum Society.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films