Epitaxial TiN(001) Grown and Analyzed in situ by XPS and UPS. II. Analysis of Ar+ Sputter Etched Layers

R. T. Haasch, T. Y. Lee, D. Gall, J. E. Greene, I. Petrov

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2 Citations (Scopus)


X-ray and ultraviolet photoelectron spectroscopies (XPS and UPS) were used to study epitaxial TiN(001) layers grown in situ which were Ar+ sputter etched. The films were deposited on MgO(001) at 850 °C in pure N2 discharges maintained at a pressure of 5 mTorr (0.67 Pa) and shown to have a N/Ti ratio of 1.02 ± 0.02 by Rutherford backscattering spectroscopy (RBS). The films were sputter etched with 3 keV Ar+ at an angle of 40° to a constant nitrogen-to-titanium ratio. A Mg Kα x-ray source was used to obtain the XPS data, while the UPS data was generated by He I and He II radiation. The sputter etched films were found to have a N/Ti ratio of 0.73, indicating a preferential removal of nitrogen.

Original languageEnglish
Pages (from-to)204-212
Number of pages9
JournalSurface Science Spectra
Issue number3
Publication statusPublished - 2000 Jul 1

Bibliographical note

Funding Information:
The authors gratefully acknowledge the financial support of the Department of Energy, under Contract No. DEFG02-96-ER45439 and the use of the facilities of the Center for Microanalysis of Materials, which is partially supported by DOE, at the University of Illinois.

Publisher Copyright:
© 2000 American Vacuum Society.

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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