Erratum: Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760))

Cheolmin Park, Jongseung Yoon, Edwin L. Thomas

Research output: Contribution to journalComment/debate

30 Citations (Scopus)
Original languageEnglish
Pages (from-to)7779
Number of pages1
Journalpolymer
Volume44
Issue number25
DOIs
Publication statusPublished - 2003 Nov 14

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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