Erratum: Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760))

Cheolmin Park, Jongseung Yoon, Edwin L. Thomas

Research output: Contribution to journalComment/debate

30 Citations (Scopus)
Original languageEnglish
Number of pages1
JournalPolymer
Volume44
Issue number25
DOIs
Publication statusPublished - 2003 Nov 14

Fingerprint

Nanotechnology
Block copolymers
Polymers

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics

Cite this

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author = "Cheolmin Park and Jongseung Yoon and Thomas, {Edwin L.}",
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journal = "Polymer",
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Erratum : Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760)). / Park, Cheolmin; Yoon, Jongseung; Thomas, Edwin L.

In: Polymer, Vol. 44, No. 25, 14.11.2003.

Research output: Contribution to journalComment/debate

TY - JOUR

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AU - Yoon, Jongseung

AU - Thomas, Edwin L.

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JO - Polymer

JF - Polymer

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