Erratum: Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760))

Cheolmin Park, Jongseung Yoon, Edwin L. Thomas

Research output: Contribution to journalComment/debatepeer-review

30 Citations (Scopus)
Original languageEnglish
Pages (from-to)7779
Number of pages1
Journalpolymer
Volume44
Issue number25
DOIs
Publication statusPublished - 2003 Nov 14

Bibliographical note

Funding Information:
C. Park thanks the Ministry of Science and Technology, the Republic of Korea, for financial support through the R & D Program for NT-IT Fusion Strategy of Advanced Technologies. J. Yoon thanks the National Science Foundation for financial support under Grant No. 0103297 (NSF-NIRT). This research was supported in part by the US Army through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02-D-0002 with the US Army Research Office. The content does not necessarily reflect the position of the Government, and no official endorsement should be inferred.

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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