Erratum: The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (Applied Surface Science (2011) 257 (3776-3779))

Doyoung Kim, Hyemin Kang, Jae Min Kim, Hyungjun Kim

Research output: Contribution to journalComment/debate

2 Citations (Scopus)
Original languageEnglish
Number of pages1
JournalApplied Surface Science
Volume257
Issue number17
DOIs
Publication statusPublished - 2011 Jun 15

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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