Erratum

The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (Applied Surface Science (2011) 257 (3776-3779))

Doyoung Kim, Hyemin Kang, Jae Min Kim, Hyungjun Kim

Research output: Contribution to journalComment/debate

2 Citations (Scopus)
Original languageEnglish
Number of pages1
JournalApplied Surface Science
Volume257
Issue number17
DOIs
Publication statusPublished - 2011 Jun 15

Fingerprint

Atomic layer deposition
Plasmas
Thin films
Hot Temperature

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

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title = "Erratum: The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (Applied Surface Science (2011) 257 (3776-3779))",
author = "Doyoung Kim and Hyemin Kang and Kim, {Jae Min} and Hyungjun Kim",
year = "2011",
month = "6",
day = "15",
doi = "10.1016/j.apsusc.2011.04.059",
language = "English",
volume = "257",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "17",

}

Erratum : The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (Applied Surface Science (2011) 257 (3776-3779)). / Kim, Doyoung; Kang, Hyemin; Kim, Jae Min; Kim, Hyungjun.

In: Applied Surface Science, Vol. 257, No. 17, 15.06.2011.

Research output: Contribution to journalComment/debate

TY - JOUR

T1 - Erratum

T2 - The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (Applied Surface Science (2011) 257 (3776-3779))

AU - Kim, Doyoung

AU - Kang, Hyemin

AU - Kim, Jae Min

AU - Kim, Hyungjun

PY - 2011/6/15

Y1 - 2011/6/15

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U2 - 10.1016/j.apsusc.2011.04.059

DO - 10.1016/j.apsusc.2011.04.059

M3 - Comment/debate

VL - 257

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 17

ER -