Erratum: The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (Applied Surface Science (2011) 257 (3776-3779))

Doyoung Kim, Hyemin Kang, Jae Min Kim, Hyungjun Kim

Research output: Contribution to journalComment/debatepeer-review

2 Citations (Scopus)

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