Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control

Won Sup Lee, Taeseob Kim, Guk Jong Choi, Geon Lim, Hang Eun Joe, Myeong Gu Gang, Hyungbae Moon, Do Hyung Kim, Byung Kwon Min, Young Pil Park, No Cheol Park

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4 Citations (Scopus)


Plasmonic lithography has been used in nanofabrication because of its utility beyond the diffraction limit. The resolution of plasmonic lithography depends on the nano-gap between the nanoaperture and the photoresist surface-changing the gap distance can modulate the line-width of the pattern. In this letter, we demonstrate solid-immersion lens based active non-contact plasmonic lithography, applying a range of gap conditions to modulate the line-width of the pattern. Using a solid-immersion lens-based near-field control system, the nano-gap between the exit surface of the nanoaperture and the media can be actively modulated and maintained to within a few nanometers. The line-widths of the recorded patterns using 15-and 5-nm gaps were 47 and 19.5 nm, respectively, which matched closely the calculated full-width at half-maximum. From these results, we conclude that changing the nano-gap within a solid-immersion lens-based plasmonic head results in varying line-width patterns.

Original languageEnglish
Article number051111
JournalApplied Physics Letters
Issue number5
Publication statusPublished - 2015 Feb 2


All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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