Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control

Won Sup Lee, Taeseob Kim, Guk Jong Choi, Geon Lim, Hang Eun Joe, Myeong Gu Gang, Hyungbae Moon, Do Hyung Kim, Byung Kwon Min, Young Pil Park, No Cheol Park

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