Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation

Jin Woo Han; Jong Yeon Kim; Hee Jin Kan; Hyun Chan Moon; Seong Ho Choi; Kwang Bum Park; Tae Ha Kim; Dae Shik Seo

doi:10.1109/NMDC.2006.4388967

Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation

Jin Woo Han, Jong Yeon Kim, Hee Jin Kan, Hyun Chan Moon, Seong Ho Choi, Kwang Bum Park, Tae Ha Kim, Dae Shik Seo

Department of Electrical and Electronic Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This letter reports the fabrication of polycrystalline silicon thin-film transistors (poly-Si TFT) on glass substrates using Al oxide films by anodizing. The a-Si films were deposited with mixture gas of argon and helium to minimize the argon incorporation into the film. The a-Si films were then laser crystallized using XeCl excimer laser irradiation and a four-mask-processed poly-Si TFTs were fabricated with fully self-aligned top gate structure.

Original language	English
Title of host publication	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Pages	698-699
Number of pages	2
DOIs	https://doi.org/10.1109/NMDC.2006.4388967
Publication status	Published - 2006
Event	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC - Gyeongju, Korea, Republic of Duration: 2006 Oct 22 → 2006 Oct 25

Publication series

Name	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Volume	1

Other

Other	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Country/Territory	Korea, Republic of
City	Gyeongju
Period	06/10/22 → 06/10/25

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering
Materials Science(all)

Access to Document

10.1109/NMDC.2006.4388967

Cite this

Han, J. W., Kim, J. Y., Kan, H. J., Moon, H. C., Choi, S. H., Park, K. B., Kim, T. H., & Seo, D. S. (2006). Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation. In 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC (pp. 698-699). [4388967] (2006 IEEE Nanotechnology Materials and Devices Conference, NMDC; Vol. 1). https://doi.org/10.1109/NMDC.2006.4388967

@inproceedings{dca91a50e3364d8b9c2b00cd1a1bb5c7,

title = "Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation",

abstract = "This letter reports the fabrication of polycrystalline silicon thin-film transistors (poly-Si TFT) on glass substrates using Al oxide films by anodizing. The a-Si films were deposited with mixture gas of argon and helium to minimize the argon incorporation into the film. The a-Si films were then laser crystallized using XeCl excimer laser irradiation and a four-mask-processed poly-Si TFTs were fabricated with fully self-aligned top gate structure.",

author = "Han, {Jin Woo} and Kim, {Jong Yeon} and Kan, {Hee Jin} and Moon, {Hyun Chan} and Choi, {Seong Ho} and Park, {Kwang Bum} and Kim, {Tae Ha} and Seo, {Dae Shik}",

year = "2006",

doi = "10.1109/NMDC.2006.4388967",

language = "English",

isbn = "1424405408",

series = "2006 IEEE Nanotechnology Materials and Devices Conference, NMDC",

pages = "698--699",

booktitle = "2006 IEEE Nanotechnology Materials and Devices Conference, NMDC",

note = "2006 IEEE Nanotechnology Materials and Devices Conference, NMDC ; Conference date: 22-10-2006 Through 25-10-2006",

}

Han, JW, Kim, JY, Kan, HJ, Moon, HC, Choi, SH, Park, KB, Kim, TH & Seo, DS 2006, Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation. in 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC., 4388967, 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC, vol. 1, pp. 698-699, 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC, Gyeongju, Korea, Republic of, 06/10/22. https://doi.org/10.1109/NMDC.2006.4388967

Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation. / Han, Jin Woo; Kim, Jong Yeon; Kan, Hee Jin et al.

2006 IEEE Nanotechnology Materials and Devices Conference, NMDC. 2006. p. 698-699 4388967 (2006 IEEE Nanotechnology Materials and Devices Conference, NMDC; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation

AU - Han, Jin Woo

AU - Kim, Jong Yeon

AU - Kan, Hee Jin

AU - Moon, Hyun Chan

AU - Choi, Seong Ho

AU - Park, Kwang Bum

AU - Kim, Tae Ha

AU - Seo, Dae Shik

PY - 2006

Y1 - 2006

N2 - This letter reports the fabrication of polycrystalline silicon thin-film transistors (poly-Si TFT) on glass substrates using Al oxide films by anodizing. The a-Si films were deposited with mixture gas of argon and helium to minimize the argon incorporation into the film. The a-Si films were then laser crystallized using XeCl excimer laser irradiation and a four-mask-processed poly-Si TFTs were fabricated with fully self-aligned top gate structure.

AB - This letter reports the fabrication of polycrystalline silicon thin-film transistors (poly-Si TFT) on glass substrates using Al oxide films by anodizing. The a-Si films were deposited with mixture gas of argon and helium to minimize the argon incorporation into the film. The a-Si films were then laser crystallized using XeCl excimer laser irradiation and a four-mask-processed poly-Si TFTs were fabricated with fully self-aligned top gate structure.

UR - http://www.scopus.com/inward/record.url?scp=50249184505&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50249184505&partnerID=8YFLogxK

U2 - 10.1109/NMDC.2006.4388967

DO - 10.1109/NMDC.2006.4388967

M3 - Conference contribution

AN - SCOPUS:50249184505

SN - 1424405408

SN - 9781424405404

T3 - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

SP - 698

EP - 699

BT - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

T2 - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

Y2 - 22 October 2006 through 25 October 2006

ER -

Fabricated poly-Si thin film transistor with anodizing Al film using nanoindentation

Abstract

Publication series

Other

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this