A novel probe structure, which can act as a planar nano-probe slide for near-field microscopy, was proposed and fabricated. Sub-wavelength apertures on a Si substrate are successfully produced by means of standard photolithography techniques with properly selected masks. In particular, the anisotropic etching characteristics of Si substrate and the hardness of the Si3N 4 film are utilized. Probe-to-probe scanning of the fabricated near-field nano-probe slide shows sub-wavelength confinement of light and comparable throughput to the conventional optical fiber probe. We also show that the nano-probe slide can serve as a supporting base and a sub-wavelength aperture to obtain the near-field photoluminescence spectra of a limited number of CdSe nanocrystals.
|Number of pages||5|
|Journal||Journal of the Korean Physical Society|
|Publication status||Published - 2004 Oct 1|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)