Fabrication of amorphous-carbon-nitride field emitters

Eung Joon Chi; Jae Yeob Shim; Hong Koo Baik; Sung Man Lee

doi:10.1063/1.119562

Fabrication of amorphous-carbon-nitride field emitters

Eung Joon Chi, Jae Yeob Shim, Hong Koo Baik, Sung Man Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

56 Citations (Scopus)

Abstract

To improve silicon field emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed, a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current.

Original language	English
Pages (from-to)	324-326
Number of pages	3
Journal	Applied Physics Letters
Volume	71
Issue number	3
DOIs	https://doi.org/10.1063/1.119562
Publication status	Published - 1997 Jul 21

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.119562

Fingerprint Dive into the research topics of 'Fabrication of amorphous-carbon-nitride field emitters'. Together they form a unique fingerprint.

Cite this

@article{a6ff8cb458a14d11b7a673ce733f5e6e,

title = "Fabrication of amorphous-carbon-nitride field emitters",

abstract = "To improve silicon field emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed, a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current.",

author = "Chi, {Eung Joon} and Shim, {Jae Yeob} and Baik, {Hong Koo} and Lee, {Sung Man}",

year = "1997",

month = jul,

day = "21",

doi = "10.1063/1.119562",

language = "English",

volume = "71",

pages = "324--326",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "3",

}

TY - JOUR

T1 - Fabrication of amorphous-carbon-nitride field emitters

AU - Chi, Eung Joon

AU - Shim, Jae Yeob

AU - Baik, Hong Koo

AU - Lee, Sung Man

PY - 1997/7/21

Y1 - 1997/7/21

N2 - To improve silicon field emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed, a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current.

AB - To improve silicon field emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed, a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current.

UR - http://www.scopus.com/inward/record.url?scp=0002685382&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0002685382&partnerID=8YFLogxK

U2 - 10.1063/1.119562

DO - 10.1063/1.119562

M3 - Article

AN - SCOPUS:0002685382

VL - 71

SP - 324

EP - 326

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 3

ER -

Fabrication of amorphous-carbon-nitride field emitters

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Cite this