Fabrication of amorphous-carbon-nitride field emitters

Eung Joon Chi, Jae Yeob Shim, Hong Koo Baik, Sung Man Lee

Research output: Contribution to journalArticlepeer-review

57 Citations (Scopus)


To improve silicon field emitters, an amorphous-carbon-nitride (a-CN) coating was applied by helical resonator plasma-enhanced chemical vapor deposition. By this process, a-CN was very uniformly coated on silicon tips without any damage. Microstructural and electrical investigation of the silicon and a-CN coated field emitters were performed, a-CN coating lowered turn-on voltage and increased emission current. Negative electron affinity of carbon nitride is suggested for enhancing emission current.

Original languageEnglish
Pages (from-to)324-326
Number of pages3
JournalApplied Physics Letters
Issue number3
Publication statusPublished - 1997 Jul 21

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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