Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee, Hyunjung Shin, Sungdong Kim, Seungbum Hong, Juhwan Chung, Hongsik Park, Jooho Moon

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume42
Issue number10 A
Publication statusPublished - 2003 Oct 1

Fingerprint

Photoresists
photoresists
Microscopes
microscopes
Fabrication
fabrication
probes
Microfabrication
Self assembled monolayers
Substrates
resonant frequencies
interlayers
Natural frequencies
curvature
damage
radii

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Lee, Jaekul ; Shin, Hyunjung ; Kim, Sungdong ; Hong, Seungbum ; Chung, Juhwan ; Park, Hongsik ; Moon, Jooho. / Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist. In: Japanese Journal of Applied Physics, Part 2: Letters. 2003 ; Vol. 42, No. 10 A.
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Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist. / Lee, Jaekul; Shin, Hyunjung; Kim, Sungdong; Hong, Seungbum; Chung, Juhwan; Park, Hongsik; Moon, Jooho.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 42, No. 10 A, 01.10.2003.

Research output: Contribution to journalArticle

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AU - Park, Hongsik

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