Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee; Hyunjung Shin; Sungdong Kim; Seungbum Hong; Juhwan Chung; Hongsik Park; Jooho Moon

doi:10.1143/jjap.42.l1171

Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee, Hyunjung Shin, Sungdong Kim, Seungbum Hong, Juhwan Chung, Hongsik Park, Jooho Moon

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

Original language	English
Pages (from-to)	L1171-L1174
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	42
Issue number	10 A
DOIs	https://doi.org/10.1143/jjap.42.l1171
Publication status	Published - 2003 Oct 1

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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10.1143/jjap.42.l1171

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title = "Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist",

abstract = "Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.",

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Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist. / Lee, Jaekul; Shin, Hyunjung; Kim, Sungdong; Hong, Seungbum; Chung, Juhwan; Park, Hongsik; Moon, Jooho.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 42, No. 10 A, 01.10.2003, p. L1171-L1174.

Research output: Contribution to journal › Article › peer-review

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AU - Lee, Jaekul

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AU - Kim, Sungdong

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AU - Chung, Juhwan

AU - Park, Hongsik

AU - Moon, Jooho

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AB - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

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