Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee; Hyunjung Shin; Sungdong Kim; Seungbum Hong; Juhwan Chung; Hongsik Park; Jooho Moon

doi:10.1143/jjap.42.l1171

Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee, Hyunjung Shin, Sungdong Kim, Seungbum Hong, Juhwan Chung, Hongsik Park, Jooho Moon

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

Original language	English
Pages (from-to)	L1171-L1174
Journal	Japanese Journal of Applied Physics
Volume	42
Issue number	10 A
DOIs	https://doi.org/10.1143/jjap.42.l1171
Publication status	Published - 2003 Oct 1

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/jjap.42.l1171

Cite this

@article{2166558e445e47f6bb52bd740746318c,

title = "Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist",

abstract = "Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.",

author = "Jaekul Lee and Hyunjung Shin and Sungdong Kim and Seungbum Hong and Juhwan Chung and Hongsik Park and Jooho Moon",

year = "2003",

month = oct,

day = "1",

doi = "10.1143/jjap.42.l1171",

language = "English",

volume = "42",

pages = "L1171--L1174",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

number = "10 A",

}

TY - JOUR

T1 - Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

AU - Lee, Jaekul

AU - Shin, Hyunjung

AU - Kim, Sungdong

AU - Hong, Seungbum

AU - Chung, Juhwan

AU - Park, Hongsik

AU - Moon, Jooho

PY - 2003/10/1

Y1 - 2003/10/1

N2 - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

AB - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

UR - http://www.scopus.com/inward/record.url?scp=0345376280&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0345376280&partnerID=8YFLogxK

U2 - 10.1143/jjap.42.l1171

DO - 10.1143/jjap.42.l1171

M3 - Article

AN - SCOPUS:0345376280

SN - 0021-4922

VL - 42

SP - L1171-L1174

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 10 A

ER -

Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this