TY - JOUR
T1 - Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist
AU - Lee, Jaekul
AU - Shin, Hyunjung
AU - Kim, Sungdong
AU - Hong, Seungbum
AU - Chung, Juhwan
AU - Park, Hongsik
AU - Moon, Jooho
PY - 2003/10/1
Y1 - 2003/10/1
N2 - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.
AB - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.
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U2 - 10.1143/jjap.42.l1171
DO - 10.1143/jjap.42.l1171
M3 - Article
AN - SCOPUS:0345376280
VL - 42
SP - L1171-L1174
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
SN - 0021-4922
IS - 10 A
ER -