Abstract
Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.
| Original language | English |
|---|---|
| Pages (from-to) | L1171-L1174 |
| Journal | Japanese Journal of Applied Physics, Part 2: Letters |
| Volume | 42 |
| Issue number | 10 A |
| DOIs | |
| Publication status | Published - 2003 Oct 1 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy (miscellaneous)
- Physics and Astronomy(all)
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Lee, J., Shin, H., Kim, S., Hong, S., Chung, J., Park, H., & Moon, J. (2003). Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist. Japanese Journal of Applied Physics, Part 2: Letters, 42(10 A), L1171-L1174. https://doi.org/10.1143/jjap.42.l1171